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    • 摘要: 显微物镜的光学性能决定显微成像质量,这对波前像差检测具有重要意义。因此,提出一种基于哈特曼波前传感器的显微物镜像差检测方法。该方法可利用双球面法标定系统误差,实现显微物镜像差的检测。建立仿真模型并模拟分析,结果表明,该方法测量的显微物镜像差与实际像差近似相等,验证了该方法的有效性。搭建实验装置并对显微物镜进行像差检测,结果表明,物镜的RMS检测精度≤10 nm,重复性精度<0.3 nm,验证了该方法的可行性,为中低倍数显微物镜波前像差检测提供了一种检测方法。

       

      Abstract: The optical performance of the microscope objective lens directly affects the quality of microscopic imaging, so it is of great significance to detect its wavefront aberration. A method for detecting the aberration of a microscopic objective lens based on a Hartmann wavefront sensor was proposed. This method employed the two-sphere method to calibrate systematic errors, enabling aberration characterization of microscope objectives. The model was established and simulated and analysed, and the results show that measured wavefront aberrations closely matched actual values, verifying model validity. The experimental setup was constructed, and the aberration detection of the microscope objective was carried out. The measurement shows the objective lens's root mean square (RMS) detection accuracy is ≤ 10 nm, with a repeatability accuracy of < 0.3 nm. This confirms the practical feasibility of the detection model. The method is simple and easy to set up, providing an detection model for wavefront aberration detection of medium and low power finite-conjugate microscope objectives.