Abstract: The lithography objective is the core component of the lithography machine, and its wave aberration determines the resolution and overlay accuracy of the lithography machine. With the gradual improvement of the performance of the lithography machine, the wave aberration requirement of the lithography objective lens has been reduced to below 0.5 nm (RMS), which is a great challenge to the detection of the wave aberration. The detection accuracy of current lithography objective wave aberration detection methods (such as Hartmann method, shear interference method and point diffraction method, etc.) is often limited by its systematic error, and absolute detection technology is a method that can separate the systematic error. The technology that came out finally broke the limit of precision. This paper reviews the wave aberration detection method and surface absolute detection technology of lithography objective lens system, combs the application and research progress of absolute detection technology in wave aberration detection in detail, and summarizes the application of absolute detection technology in different wave aberration detection methods. At the same time, combined with these difficulties, the future development trend of the absolute detection technology of wave aberration of lithography objective lens is prospected.