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Solar-blind photodetectors(SBPDs) exhibit advantages such as high sensitivity, high communication accuracy, and high signal-to-noise ratio, making them highly desirable for applications in ozone hole monitoring, corona detection, missile warning, and other military and civil fields. Among the materials utilized for SBPDs, Ga2O3 is particularly attractive due to its bandgap that inherently corresponds to a solar-blind spectrum without any alloy and dopant. Generally, crystalline Ga2O3 exists in various polymorphs, including α, β, γ, ε, and δ. Among these, β-Ga2O3 possesses the most stable structure. Therefore, β-Ga2O3 in the form of thin films, nano-structures, and single crystals has been widely explored for detection applications. In 2018, Kanika et al. reported the growth of β-Ga2O3 thin films on silicon substrates using a high-temperature seed layer and successfully constructed a solar-blind UV photodetector. The device demonstrated excellent performance under extremely weak ultraviolet signals (44 nW/cm2) with a responsivity of 96.13 AW−1 and an external quantum efficiency of 4.76×104. In 2019, Wang et al. prepared a high-quality β-Ga2O3 film on a sapphire substrate via magnetron sputtering followed by post-deposition annealing. Furthermore, a metal-semiconductor-metal(MSM) structure photodetector was successfully prepared. This device exhibited a photo-to-dark current ratio greater than 103, a response time of 0.31 s, and a decay time of 0.05 s. However, the high-temperature growth conditions required for β-Ga2O3 can increase the cost and complexity of the process, potentially hindering its widespread applications.
The amorphous Ga2O3 (a-Ga2O3), with its uniform structure, is getting popular among researchers worldwide, as it is fabricated through a simple process at low temperatures. As previously reported, a-Ga2O3-based photodetectors can obtain performance comparable to that of β-Ga2O3 photodetectors. Currently, radio frequency(RF) magnetron sputtering has been widely applied to prepare a-Ga2O3 thin films, which has the advantages of a fast growth rate, simplicity of operation, and low cost. However, despite the high responsivity of a-Ga2O3 solar-blind photodetectors prepared by RF magnetron sputtering, this high responsivity is often accompanied by a slow response speed. The reason for this is the presence of a large number of oxygen vacancies in the a-Ga2O3 films deposited via magnetron sputtering. In this paper, we optimized the oxygen partial pressure during magnetron sputtering to control the concentration of oxygen vacancies in the film. We prepared MSM photodetectors to investigate the effect of different oxygen partial pressures on the performance of the solar-blind photodetectors. The results demonstrate that the oxygen partial pressure can effectively regulate the oxygen vacancies in a-Ga2O3 thin films, and an optimized oxygen partial pressure allows the photodetector to achieve a balance between responsivity and response speed.
The schematic diagram of the a-Ga2O3 MSM SBPD (left) and its microscopic image (right)
(a) GIXRD spectra of the substrate and a-Ga2O3 film deposited at pure Ar; (b) XPS survey of a-Ga2O3 film deposited at pure Ar
Optical transmittance spectra of a-Ga2O3 films deposited at different oxygen partial pressures and (αhν)2-hν plots(inset)
XPS O 1s core level and fitting results of a-Ga2O3 films under different oxygen partial pressures. (a) O 1s core level of a-Ga2O3 films with different oxygen partial pressures; Fitting results of O 1s core level of (b) pure Ar, (c) 3% oxygen partial pressure, and(d) 7% oxygen partial pressure
The current-voltage(I-V) of the a-Ga2O3 MSM SBPDs under different oxygen partial pressures. (a) The dark current characteristics and the responsivity under three conditions(inset); (b) The photocurrent characteristics(254 nm, 80 μW/cm2)
Transient responses of a-Ga2O3 MSM SBPDs under different oxygen partial pressures. (a) Transient response for multicycles; (b) Normalized transient response; Experimental and fitted curves of the rise and decay processes for the device with (c) 3% oxygen partial pressure and (d) 7% oxygen partial pressure