Research progress of laser-assisted chemical vapor deposition

Laser chemical vapor deposition (LCVD) technology has its unique advantages in reducing deposition temperatures, enhancing film purity and directly writing complex thin film patterns compared with conventional chemical vapor deposition (CVD). This technology has been widely applied in thin film deposition and attracted growing attention from both research and industries. This review categorizes the LCVD technology into three types according to the laser-matter interaction mechanisms, including laser pyrolysis, laser photolysis, and laser resonance excitation sensitization. We illustrate the deposition principles governed by the three different mechanisms in detail, and briefly introduce the commonly used equipment, and summarize the latest research progress of LCVD technology in synthesis and applications of metals, carbon-based materials, oxides and semiconductors. The detection and analysis methods used in LCVD are specially introduced, and the challenges and prospects of LCVD in material synthesis are discussed.