In order to solve the two difficult problems of the poor processing controllability and the low surface accuracy of quartz aspheric microlens array processing, a fabrication method of quartz aspheric microlens array for turning mask is proposed. This method mainly uses single point diamond turning technology and reactive ion etching technology, studies the turning and etching properties of the mask material, and optimizes the mask material by experiment. Finally, the fabrication of an aspherical glass microlens array with an area of 5 mm×5 mm was carried out. The experimental results are compared with the expected parameters. The analysis shows that the error root mean square of the quartz glass component is 1.155 nm, and the surface accuracy error is 0.47%.
Fabrication method of quartz aspheric microlens array for turning mask
First published at:Apr 01, 2018
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Get Citation: Wang Hao, Dong Lianhe, Zhu Guodong, et al. Fabrication method of quartz aspheric microlens array for turning mask[J]. Opto-Electronic Engineering, 2018, 45(4): 170671.
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